Glovebox-Integrated Laser Floating Zone Furnace
GB-LFZ – Complete oxygen- and moisture-free crystal growth process chain
Integrated glovebox laser floating zone furnace enabling a complete oxygen and moisture free crystal growth process chain
The Glovebox-Integrated Laser-Heated Floating Zone Furnace (GB-LFZ) combines the proven performance of laser floating zone crystal growth with a fully integrated inert-atmosphere glovebox, enabling a completely oxygen- and moisture-free crystal growth workflow. Designed for highly air-sensitive materials, the system allows every handling and processing step, from transferring the synthesized feed rod into the system to retrieving the finished single crystal, to be carried out without exposure to ambient atmosphere.
To the best of our knowledge, the GB-LFZ is the first commercially available floating zone crystal growth system providing a completely inert process chain. Air-sensitive materials can be prepared in an external glovebox, sealed inside a hermetic transfer container, introduced through the GB-LFZ airlock, and opened only inside the integrated glovebox. The feed rod is then mounted directly into the process chamber for crystal growth with glovebox gloves as handling means. After growth, the crystal is removed inside the glovebox, transferred into a hermetic storage container, and safely transported to an external glovebox for further sample preparation or characterization. When handled in this way, the material remains under inert conditions throughout the entire workflow and is never exposed to oxygen or moisture.
Based on the established Compact Laser Floating Zone Furnace LFZ, the GB-LFZ integrates the complete crystal growth system into a spacious argon-filled glovebox equipped with an integrated vacuum airlock or, optionally, a direct connection to a standard laboratory glovebox. This enables seamless integration into existing inert-atmosphere laboratories. Crystal growth takes place inside a hermetically sealed process chamber operating independently of the surrounding glovebox atmosphere. The chamber supports high vacuum as well as inert or reactive process atmospheres up to 10 bar, while the glovebox maintains a continuously inert environment.
Heating is provided by five independently controlled 300 W diode lasers (976 nm), producing a highly homogeneous power distribution for stable floating zone operation and melting temperatures up to 3000 °C. A high-resolution HDR camera, two-color pyrometer and intuitive control software provide comprehensive process monitoring and precise control of all growth parameters.
The GB-LFZ is ideally suited for crystal growth of materials that are highly sensitive to oxygen or moisture, including air-sensitive intermetallics, rare-earth compounds, fluorides, oxygen-deficient functional materials and many other advanced materials. By combining powerful laser floating zone technology with complete inert-atmosphere sample handling, the GB-LFZ enables crystal growth of materials that are difficult or impossible to process using conventional floating zone furnaces.
Laser Heating
- Standard configuration: 5 × 300 W diode lasers (total optical power 1.5 kW)
- Optional higher laser power configurations available
- Laser wavelength: 976 nm (others on request)
- Independent step-less power control for each laser module
- Melting temperatures up to approximately 3000 °C (material dependent)
- Optimized homogeneous laser beam profile
- Contact-free heating with minimized contamination
Integrated Inert-Atmosphere Glovebox
- Complete floating zone system integrated inside an inert-atmosphere glovebox
- Slight positive-pressure argon atmosphere
- Integrated transfer airlock
- Optional direct connection to external laboratory gloveboxes
- Optional gas purification system
- Typical atmosphere quality according to glovebox configuration (e.g. O2/H2O < 1 ppm with gas purification)
- Oxygen- and moisture-free handling throughout the complete crystal growth process
Process Chamber
- Hermetically sealed growth chamber
- Independent from glovebox atmosphere
- Process pressure: 10-3 mbar (vacuum) to 10 bar pressure
- Standard process gases: Ar/O2
- Optional customer-specific process gases
Crystal Growth
- Maximum feed rod diameter: 8 mm
- Maximum crystal length: 150 mm
- Precision linear translation system
- Independent seed and feed rod rotation
- Pulling rate: 0.1 mm/h – 200 mm/h
- Rotation rate: 0 – 50 rpm
- Programmable power and travelling ramps
Process Observation
- High-resolution HDR camera
- Two-color pyrometer
- Live process monitoring
- Video recording and image acquisition
- PLC-based control software with intuitive graphical user interface
Required Utilities
- Argon gas supply
- Oxygen supply (optional depending on process)
- Cooling water
- Exhaust system
- Three-phase AC power supply
System Dimensions
- 2200 × 860 × 1930 mm (L × W × H)